Are there there any new data on the root causes of CMP
defects? Are there quantitative data on silica type (e.g., precipitated, vs.
sol-gel vs. Stöber process) affecting agglomeration?
Pls see the attached paper by JSR (made public at the 2008 Lake Placid CMP Conference) highlighting that pad debris are one of the main root causes of defects in CMP.
I would certainly appreciate more discussion on this topic and the posting of more public domain presentations or papers for the readers.
Much of the recent defect data of which I am aware comes from suppliers demonstrating the merits of their pad or slurry or other consumable over some chosen reference standard. If there are any new academic or fab projects underway on this subject, I would love to hear about them here.
We're now (January 20th, 2010) past the
official ending (the 18th) of this virtual roundtable discussion, after 4695 views of 129 replies to 18 questions. I'll
edit together Interesting discussions from most of the topics into a
summary document that will be posted to the Planarization Lounge.
We'll leave the topic posting open in case there are additional comments...but they would not be included in the summary.
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