AccuThermo AW 820V  Vacuum Rapid Thermal Processing System  BASIC SYSTEM CONFIGURATION

• AW 820V Main Frame with wires.
• Aluminum chamber with water cooling and top/bottom plates gold plating.
• Anodized Aluminum Chamber with top and bottom quartz window plates.
• Oven control board and main control board
• Top heating with 27 (1.5KW ea) Radiation heating lamp module with 4
• bank zones (Top Front&Rear, Bottom Front&Rear).
• Quartz Tray for 5 to 8 inch or 4 to 6 inch round (or square) wafer
• Three gas lines with two MFCs with shut-off valves.
• Computer with AW Software, Touch Screen Monitor, Mouse, Standard
• Keyboard
• T Shape Quartz with TC and one holder for 100-800°C
• One package of 5 pieces of thermocouple wires
• One USB with original Software backup

AccuThermo AW 820V Vacuum Rapid Thermal Processing System SYSTEM SPECIFICATION

 Stand Alone and Manual loading of wafer into the oven
 Single wafer processing.
 Substrate: 2″, 3″, 4″,5″,6″,8″; Square or round; Transparent and Nontransparent
 Ramp up rate: Programmable, 10°C to 150°C per second.
 Recommended steady state duration: 0-600 seconds per step.
 Ramp down rate: Non-Programmable, 10°C to 150°C per second..
 Recommended steady state temperature range: 150°C – 1150°C
 Vacuum Pressure (Optional): 50 mtorr to 13 Torr or 13 Torr to 760 Torr
 Atmospheric function is optional
 Patented Temperature Sensor temperature accuracy: ±1°C.
 Thermocouple temperature accuracy: ±0.5°C
 Temperature repeatability: ±0.5°C or better at 1150°C
 Temperature uniformity: ±8°C across a 8″ (200mm) wafer at 1150°C
 Process/Purge gas inputs: Any inert and/or non-toxic gas. Typically,N2,O2,Ar,NH3,N2O are used.

AccuThermo AW 820V  Vacuum Rapid Thermal Processing System OPTIONS

 Quartz Tray for Square (or round) substrate (5 to 8 inch or 4 to 6 inch)
 Patented Temperature Sensor For 400-1250°C.
 More gas lines with shut-off valve and gas PCB – 3 MFCs,4 MFCs
 Susceptor or carrier (Base &Cover or Base or Cover) for transparent, small pieces, metal thin film substrate:
– Materials: Graphite with SiC coating; Sintered SiC; Silica with SiC Coating; Pure Single Crystal Si; Silicon Wafer with pocket
– Size:2″, 3″, 4″,5″,6″,4X2″,3X3″,Customized size.
 Polished Stainless Steel chamber with water cooling.
 With Atmospheric Function
 With pressure control function (50 mtorr to 13 Torr or 13 Torr to 760 Torr)
 Mechanical or Dry vacuum pump
 Turbo pump for High Vacuum Function: Less than 1X10-6 mbar